Jasper DUV

AVAILABLE Q1 2027

4W at 258 nm

> 25 µJ

< 500 fs

LONG-TERM POWER STABILITY

M² ≤ 1.3 (typ.)

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Jasper X1 Femtosecond Laser High power for industrial use
Jasper X1 Femtosecond Laser High power for industrial use
Co-engineered with

2-year

laser warranty

5-year

oscillator warranty

Industrial-grade Deep UV laser for semiconductor and display industries

Co-engineered by Fluence and OXIDE — two experts, one solution

> 3000 h without degradation (single location)

> 3000 h without degradation (single location)

> 4 W average power at DUV (258 nm)

> 4 W average power at DUV (258 nm)

Maximum pulse energy > 25 μJ

Maximum pulse energy > 25 μJ

Repetition rate adjustable from Single Pulse to 1 MHz

Repetition rate adjustable from Single Pulse to 1 MHz

Well-balanced power vs pulse energy characteristic for optimal material processing

Well-balanced power vs pulse energy characteristic for optimal material processing

Pulse duration < 500 fs

Pulse duration < 500 fs

Superior beam quality with M² < 1.4 (<1.3 typ.)

Superior beam quality with M² < 1.4 (<1.3 typ.)

Advanced Pulse-on-Demand for precise triggering with timing jitter under 50 ns

Advanced Pulse-on-Demand for precise triggering with timing jitter under 50 ns

Easy maintenance and in-situ exchange of DUV nonlinear crystals

Easy maintenance and in-situ exchange of DUV nonlinear crystals

User-replaceable consumables

User-replaceable consumables

Comprehensive, long-term support at the customer site

Comprehensive, long-term support at the customer site

Fluence femtosecond laser

The Jasper X1 is a high-performance industrial femtosecond laser system built for advanced materials processing. With Advanced Pulse-on-Demand (APoD) and nanosecond-level jitter, it delivers exceptional timing precision for sharp edges, clean corners, and maximized duty cycles — all from a robust, all-fiber, SESAM-free design built for maintenance-free 24/7 operation. Its all-fiber architecture also delivers exceptional pulse-to-pulse energy and power stability, a clean symmetric beam mode, and consistent pulse duration — the exact input quality required for efficient, stable DUV conversion.

OXIDE Deep UV module

Powered by the proprietary nonlinear crystal and wavelength conversion technologies of Japan-based OXIDE, this Deep UV Module delivers high-power 258 nm femtosecond laser output with outstanding beam quality, enabling precision micromachining with minimal heat-affected zones for advanced manufacturing. Backed by over 20 years of OXIDE’s experience stabilizing DUV laser radiation for the semiconductor industry.


Read more about OXIDE


Two experts' knowledge, one integrated solution

Reliable DUV generation demands two critical elements working in perfect harmony: an exceptionally stable input beam and precise wavelength conversion expertise. Our partnership represents the ideal match — creating a powerful synergy where Jasper X1’s all-fiber stability meets OXIDE’s 20+ years of DUV conversion mastery, producing a robust 258 nm output neither could achieve alone.

Together, we deliver a DUV platform engineered for high efficiency and top-tier stability, enabling precision micromachining for semiconductor, display, medical device, and electronics manufacturing. By maximizing your production yield and ensuring consistent, long-term performance, we provide ultimate peace of mind and unwavering operational reliability. Backed by a shared global service network, the complete system is fully supported on-site, wherever you are.

Preliminary specification

Output

Central wavelength

Central wavelength

Average power

Average power

Max. pulse energy

Max. pulse energy

Pulse duration

Pulse duration

Beam quality, M²

Beam quality, M²

PRR tunability

PRR tunability

Beam circurality

Beam circurality

Beam divergence

Beam divergence

Beam diameter

Beam diameter

Power stability (NRMSD)

Power stability (NRMSD)

Pulse-to-pulse energy stability (NRMSD)

Pulse-to-pulse energy stability (NRMSD)

Leakage from port when not selected

Leakage from port when not selected

DUV module expected lifetime without crystal shift

DUV module expected lifetime without crystal shift

FHG DUV

257.5 ±1.25 nm

257.5 ±1.25 nm

Central wavelength

257.5 ±1.25 nm

4 W

4 W

Average power

4 W

25 µJ

25 µJ

Max. pulse energy

25 µJ

<500 fs

<500 fs

Pulse duration

<500 fs

< 1.4 (< 1.3 typical)

< 1.4 (< 1.3 typical)

Beam quality, M²

< 1.4 (< 1.3 typical)

SP - 1 MHz

SP - 1 MHz

PRR tunability

SP - 1 MHz

> 80%

> 80%

Beam circurality

> 80%

< 0.5 mrad

< 0.5 mrad

Beam divergence

< 0.5 mrad

3.5 ± 0.5 mm

3.5 ± 0.5 mm

Beam diameter

3.5 ± 0.5 mm

< 2%

< 2%

Power stability (NRMSD)

< 2%

< 2% (< 1% typ.)

< 2% (< 1% typ.)

Pulse-to-pulse energy stability (NRMSD)

< 2% (< 1% typ.)

< 1 %

< 1 %

Leakage from port when not selected

< 1 %

> 3000 h

> 3000 h

DUV module expected lifetime without crystal shift

> 3000 h

Other characteristics

Cooling

Manual shutter

Module mounting method

Purging requirement

Advanced Pulse-on-Demand

Whole unit

Water

Cooling

Water

Manual mechanical cover can be attached on each output port

Manual shutter

Manual mechanical cover can be attached on each output port

The module can be attached to Jasper X1 laser head or be mounted separately

Module mounting method

The module can be attached to Jasper X1 laser head or be mounted separately

External purging by clean dry air

Purging requirement

External purging by clean dry air

Included

Advanced Pulse-on-Demand

Included

Learn more about Advanced Pulse-on-Demad:

Download brochure

Physical

Dimension (L x W x H)

Dimension (L x W x H)

Weight

Weight

Optical output ports

Optical output ports

Jasper X1

1096 x 446 x 100 mm

1096 x 446 x 100 mm

Dimension (L x W x H)

1096 x 446 x 100 mm

75 kg

75 kg

Weight

75 kg

1

1

Optical output ports

1

DUV Module

275 x 426 x 100 mm*

275 x 426 x 100 mm*

Dimension (L x W x H)

275 x 426 x 100 mm*

13 kg

13 kg

Weight

13 kg

One per each wavelength (1030 nm; 515 nm; 258 nm)

One per each wavelength (1030 nm; 515 nm; 258 nm)

Optical output ports

One per each wavelength (1030 nm; 515 nm; 258 nm)

* Possibility to mount apart from laser head

All specifications are subject to change without prior notice due to continuous improvements.

Download Datasheet

Performance data

  • FHG temporal profile
    FHG temporal profile
  • Pulse repetition rate vs FHG power
    Pulse repetition rate vs FHG power
  • Power stability when switching laser output
    Power stability when switching laser output
  • Long term power stability
    Long term power stability
  • Typical power stability
    4W DUV beam profile at focal point
  • M2 at each FHG power (W)
    M² at each FHG power (W)

Be among the first to deploy Jasper DUV

Jasper DUV is approaching market launch. Contact Artur Strabawa, our OEM Project Manager, to get the final specification first and secure your place in the delivery queue. We are also happy to hear your requirements and discuss how the system can best fit your application.

Artur Strabawa

OEM Project Manager

astabrawa@fluence.technology

GET IN TOUCH

Choose your path forward

De-risk your investment

Don’t guess – verify. We invite you to utilize our Ultrafast Laser Application Laboratory (ULAL) to test your samples.

Book a feasibility check

Know what you need? Get a quote.

Just fill out the form with your required laser parameters, and one of our experts will get back to you with a tailored offer.

Get a quote

De-risk your investment

Don’t guess – verify. We invite you to utilize our Ultrafast Laser Application Laboratory (ULAL) to test your samples.

Book a feasibility check

Know what you need? Get a quote.

Just fill out the form with your required laser parameters, and one of our experts will get back to you with a tailored offer.

Get a quote

portoflio

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AVAILABLE Q1 2027

Jasper DUV

Industrial-grade Deep UV laser

4W at 258 nm

> 25 µJ

< 500 fs

LONG-TERM POWER STABILITY

M² ≤ 1.3 (typ.)

Jasper X1 Femtosecond Laser High power for industrial use

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200 µJ

< 270 fs – 20 ps

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